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3064 Kenneth Street

Santa Clara, CA  95054

To contact us:

Phone: 408-855-8686

Email: info@agsplasma.com

AGS Plasma Systems, Inc.

PVD Product Detail

A versatile multi-process PVD tool with flexible controls and excellent uniformity - all for low price.

If you need reliability time after time when depositing low temperature films, the MPS Physical Vapor Deposition tool offers you the best value. Excellent process control and trouble-free operation can be yours.

Product Summary

MPS-PVD Features

Modular Design for Ease of Maintenance

Single or Dual Chamber

Batch or Single Substrate

Small Foot Print

Stainless Steel or Aluminum Process Chambers

Cost Effective Process Solution

Automatic Process Controller using Windows®

MPS-XX0-PVD available in 50-150, 200, & 300 mm versions

Manual load or a variety of vacuum load locks are available.

 

The MPS series is also available as an OEM module to integrate to existing system platforms.

High performance PVD at a low cost

Al, Au, AlSi, Cu, AlCuSi metallization

SiO2, SiNx, TaN, TiNx films Low temperature passivation and ILD films for III-V and HTSC compounds

Configure as single or multi-target deposition tool

DC or RF sputtering options available

Safe, rugged design means high reliability with remarkable uptime

Low hydrogen containing films assured by using residual stripping cryo pump

Unique "Direct-Connect" construction is easy to service or upgrade

Easy to use and simple to service

Delivery: 90 days ARO
Warranty: 1 year parts & labor
Installation: Start up & training are available with the system
Service: Extended warranty &  PM's can be included

MPS-203-PVD —  Physical Vapor Deposition

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