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3064 Kenneth Street

Santa Clara, CA  95054

To contact us:

Phone: 408-855-8686

Email: info@agsplasma.com

AGS Plasma Systems, Inc.

PECVD Product Detail

A versatile multi-process PECVD tool with flexible controls and excellent uniformity - all for low price.

If you need reliability time after time when depositing low temperature films, the MPS Plasma Enhanced Chemical Vapor Deposition tool offers you the best value. Excellent process control and trouble-free operation can be yours.

Product Summary

MPS-PECVD Features

Modular Design for Ease of Maintenance

Single or Dual Chamber

Batch or Single Substrate

Small Foot Print

Stainless Steel or Aluminum Process Chambers

Cost Effective Process Solution

Automatic Process Controller using Windows®

MPS-XX0-PECVD available in 50-150, 200, & 300 mm versions

Manual load or a variety of vacuum load locks are available.

The MPS series is also available as an OEM module to integrate to existing system platforms.

High performance PECVD at a low cost

SiO2, SiNx, Amorphous Si, Oxynitride and carbon films

Low temperature passivation and ILD films for III-V and HTSC compounds

Configure as PECVD or ICP deposition tool

Safe, rugged design means high reliability with remarkable uptime

Low hydrogen containing films assured by using residual stripping cryo pump

Mixed frequency and pulsed RF options for stress control

Closed loop (PID) control of deposition temperature

Unique "Direct-Connect" construction is easy to service or upgrade

Easy to use and simple to service

Delivery: 90 days ARO
Warranty: 1 year parts & labor
Installation: Start up & training are available with the system
Service: Extended warranty &  PM's can be included

MPS-200-PECVD —  Plasma Vapor Deposition

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