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3064 Kenneth Street Santa Clara, CA 95054 |
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Phone: 408-855-8686 Email: info@agsplasma.com |
AGS Plasma Systems, Inc. |
Etch Product Detail |
The classic, high performance, value priced, RIE plasma tool used throughout the world for over ten years - and still going strong! This system is your best bet when you have a variety of demanding applications. The MPS-RIE is great for day-to-day use at the push of a button. |
Product Summary |
MPS-RIE Features Modular Design for Ease of Maintenance Single or Dual Chamber Batch or Single Substrate Small Foot Print Stainless Steel or Aluminum Process Chambers Cost Effective Process Solution Automatic Process Controller using Windows® MPS-XX0-RIE available in 50-150, 200, & 300 mm versions Manual load or a variety of vacuum load locks are available.
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Best built R&D or low volume production tool available Si, SiO2, SiNx, Metals, TiW, GaAs, resist, ILD and polyimide, micromachining (MEMS), photonics, HTSC's, and for failure analysis Accepts any size substrate from 1" to 12" wafers, flat panels, or custom packages Easy to use and simple to service Safe, rugged design means high reliability with remarkable uptime Simple 5 piece chamber construction is versatile and easy to upgrade Multi-use process kit with virtually no process memory effect Advanced Reactor technologies, such as RIE, RIE/PE, and ICP are available as standard modules. |
Delivery: 90 days ARO |
MPS-200-RIE — Reactive Ion Etcher |
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For more information—Please contact us: Phone: (408) 855-8686 Email: sales@agsplasma.com |