AGS Plasma Systems, Inc.
High Density Plasma
HDP Source
Using our standard 1700 platform, this Inductively Coupled Plasma (ICP) tool can be helpful where high etch rates and low damage are required. AGS utilizes a compact, self contained, economical HDP plasma source.
High density tools offer the ability to produce a very reactive plasma with
less radiation exposure to your substrate. Higher etch (or deposition) rates
and lower processing temperatures are just two of the benefits of HDP's. Our
HDP system utilizes our basic RIE (or PECVD) platform and utilizes a patented,
highly reliable, magnetically coupled plasma (MCP) source to produce high yield
ion flux. MCP sources offer greater reliability over ECR sources due to our
unique multi-coil design and by using lower frequencies. Normally used for
etching, it is also available in a deposition version and either are field
retrofitable.
Delivery: 90 days ARO
Warranty: 1 year parts & labor
Installation: Start up & training are included with the system
Service: 1 year of quarterly PM's are included with each system
Extraordinary capability -
Excellent value
"A whole new plasma system"
Please send your questions, comments, or suggestions to the AGS Sales desk
Copyright 1991-2004 AGS Plasma - All Rights Reserved
System 1700, APC-1000, & PlasmOps are trademarks of AGS Plasma.
Other trademarks are the property of their respective owners.
Prices and specifications subject to change without notice.
Last update made on: 6 September, 2004 by Webmaster