Product Detail CVD

3064 Kenneth Street

Santa Clara, CA 95054

To contact us:

Phone: 408-855-8686

Email: info@agsplasma.com

AGS Plasma Systems, Inc.

AGS Plasma Systems, Inc.

Transforming Technology into Affordable Solutions

PECVD Product Detail

A versatile multi-process PECVD tool with flexible controls and excellent uniformity - all for low price.

If you need reliability time after time when depositing low temperature films, the MPS Plasma Enhanced Chemical Vapor Deposition tool offers you the best value. Excellent process control and trouble-free operation can be yours.

Product Summary

MPS-PECVD Features

Modular Design for Ease of Maintenance
Single or Dual Chamber
Batch or Single Substrate
Small Foot Print
Stainless Steel or Aluminum Process Chambers
Cost Effective Process Solution
Automatic Process Controller using Windows®
MPS-XX0-PECVD available in 50-150, 200, & 300 mm versions
Manual load or a variety of vacuum load locks are available.
The MPS series is also available as an OEM module to integrate to existing system platforms.

High performance PECVD at a low cost
SiO2, SiNx, Amorphous Si, Oxynitride and carbon films
Low temperature passivation and ILD films for III-V and HTSC compounds
Configure as PECVD or ICP deposition tool
Safe, rugged design means high reliability with remarkable uptime
Low hydrogen containing films assured by using residual stripping cryo pump
Mixed frequency and pulsed RF options for stress control
Closed loop (PID) control of deposition temperature
Unique "Direct-Connect" construction is easy to service or upgrade
Easy to use and simple to service

Delivery: 90 days ARO
Warranty: 1 year parts & labor
Installation: Start up & training are available with the system
Service: Extended warranty & PM's can be included

MPS-200-PECVD — Plasma Vapor Deposition

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